Used KARL SUSS / MICROTEC Gamma #293814499 for sale
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ID: 293814499
Wafer Size: 8"
Vintage: 2006
Spin coater, 8"
Coating module
No gearset cover
(2) Input/Output (I/O) ports
Genmark GB4 Robot
Mechanical centering station
(3) Hotplates
(2) Coolplates
No HMDS module
(2) Waste tanks
Wafertec F-30/F Photoresist pump
2006 vintage.
KARL SUSS / MICROTEC Gamma is a photoresist equipment designed for high-resolution microfabrication. Photoresist is a photosensitive material that is used to create patterns on a substrate for microfabrication. MICROTEC Gamma system utilizes a high-precision fiber-optic illumination unit capable of accurately positioning and exposing a wide variety of photoresists with high-resolution images. This machine also features a built-in pre-alignment stage which allows for the substrate to be accurately positioned in front of the lens for the exposure process. KARL SUSS Gamma tool is ideal for both single-level photolithography processes and multilevel processes using multiple resist layers. It is capable of producing patterns with feature sizes ranging from 10 micrometers to less than a micrometer using different types of resist including standard, negative, and positive resists. Gamma asset has a modular design which allows for different plate sizes and different photolithography configurations to be used based on the application. KARL SUSS / MICROTEC Gamma model is also extremely precise and repeatable, making it possible to produce patterns with high accuracy and repeatability. The exposure process of MICROTEC Gamma equipment can be controlled with a variety of parameters, including exposure time, lamp power, wavelength, and focussing position. This makes the system suitable for applying patterns with high resolution and image repeatability. A unique feature of KARL SUSS Gamma unit is its focus movment control, which allows for accurate and repeatable monitoring of the focus position during an exposure. This helps to avoid image blur due to incorrect focussing and ensures the highest resolution images. Gamma machine also includes a Peltier effect cooling tool to precisely and accurately control the temperature of the resist layer during exposure. This helps to avoid undesirable variations in resist viscosity, leading to improved resolution and repeatability of the patterns. In addition, KARL SUSS / MICROTEC Gamma asset includes a variety of other features to facilitate its operation, such as an optical viewer to inspect mask holders and substrates, a programmable auto-focus tracking model, and a "timer-mode" program to control the exposure time and other parameters. Overall, MICROTEC Gamma equipment is an outstanding photolithographic system for high-resolution microfabrication, offering precision, accuracy, and repeatability for the most demanding applications.
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