Used KARL SUSS / MICROTEC Gamma #9260876 for sale

KARL SUSS / MICROTEC Gamma is an advanced photoresist equipment, offering precise, automated control over time and temperature during photoresist processing. It is designed for advanced microfabrication projects requiring a high level of precision in the fabrication of thin films over a wide range of applications. The system works by exposing photoresist to shortwave UV light in order to selectively harden or crosslink the photoresist. This light is carefully tuned to match the wavelength of the active compound within the photoresist, ensuring an accurate and precise fabrication process. MICROTEC Gamma unit also offers a range of other features to help meet the user's needs. The machine can be configured for a wide variety of temperatures and lengths of exposure, allowing for precise control over time and temperature. The tool features separate heating and cooling zones, ensuring accuracy and preventing errors. Other features include surface focus arrows, plate suspension pins for precise pneumatic extraction, and an integrated airfiltration asset. The model also features a range of precise alignment tools, allowing users to accurately position masks, workpieces, and other areas. KARL SUSS Gamma's imaging equipment includes a digital microscope, enabling users to monitor the photoresist processing in real-time and to check for accuracy. The system is easy to operate and maintain, and is fast, safe and reliable. It is designed to work with a variety of photoresist materials, making it suitable for a variety of different microfabrication projects. Additionally, its automated systems ensure accuracy and efficient processing of photoresist. Overall, Gamma photoresist unit is a highly accurate and precise photoresist machine, offering a range of features that make it suitable for a variety of microfabrication projects. It offers automated temperature and exposure control, separate heating and cooling zones, precise alignment tools, and a digital microscope for real-time monitoring of photoresist processing. It is easy to use and requires minimal maintenance.