Used KARL SUSS / MICROTEC Gamma #9384738 for sale

KARL SUSS / MICROTEC Gamma photoresist equipment is a high-precision solution for development and etching on advanced semiconductor substrates. It is a stepper-level lithography system capable of reliably and consistently processing photoresist of any type, including the latest advanced chemical-amplified photoresists (CAPR). This unit utilizes a crossed 6-axis microscope stage with high resolution encoders that provide precise and reliable alignment, stage motion, multilayer alignment, and nanoprocessing capabilities. This stepper-level machine is capable of imaging features ranging from 1-500nm and supports several advanced patterning and etching techniques. MICROTEC Gamma allows for high-precision photolithography on a variety of semiconductor substrates, including fragile III-V materials. The tool is equipped with a 4-step "produce and release" function for quick and easy development of photoresist patterns. Its advanced XY stage and exposure asset are capable of programming dense patterns with high fidelity. The model is also equipped with a wide range of other features, including the ability to achieve high-resolution scanning in a short period of time, control of subsiding features, and random patterning for precise thermal imaging applications. KARL SUSS Gamma also includes a host of features for precise alignment and process control, including real-time continuous alignment and fine apertures for fine exposure control. The equipment's controller is capable of driving up to 16 multilayer stacks with reliable results. It also includes a variety of magnification options, from 2x to 300x, as well as a powerful special optical system for precise examination of clear and opaque materials. Furthermore, high-precision wafer alignment is enabled through automated correlation techniques and tiling functionality. In addition to the advanced features mentioned above, Gamma photoresist unit offers superior safety features. It utilizes 8-channel pattern verification systems to protect against shorts and scratches, as well as a full-interface etching machine for precise etching control. The tool's advanced air filtration asset ensures a clean working environment, and the temperature controller reproduces both process conditions and environment. Overall, KARL SUSS / MICROTEC Gamma photoresist model is a powerful solution for semiconductor processing. With its high-precision features and advanced safety mechanisms, it can reliably and accurately develop photoresist patterns with excellent repeatability and reproducibility. Of course, this equipment comes at a cost—but for those with serious lithography needs, it may be worth the investment.