Used KARL SUSS / MICROTEC JWS LTC #9289946 for sale

KARL SUSS / MICROTEC JWS LTC
ID: 9289946
Vintage: 2009
Precision roll coater systems (2) Dryers 2009 vintage.
KARL SUSS / MICROTEC JWS LTC is an advanced photoresist processing equipment used in the fabrication of semiconductor devices. The system offers a comprehensive suite of features and functions for lithography, etching, and cleaning of the resist layer. The unit utilizes a resist-coated substrate mounted in a jig that is exposed to ultra violet (UV) light. This light breaks down the resist soluble molecules, exposing the underlying surface to the etchant. During this process, the exposed or "shadowed" regions will accept the etchant while the exposed or "bright" regions will remain unaffected. The machine offers precise control of exposure parameters and is designed to work with the broadest range of resists. Its precise control over exposure dose, spot size, and exposure pitch ensure precise results no matter what type of resist is being processed. In addition to precise control over exposure parameters, the tool includes a high-resolution imaging asset that allows for optimal focus as well as maintaining precise profiles over large surface areas. This means higher image quality and precise control of the resist surface. The model also features a dedicated etching station for precise control of etching parameters. This ensures etching times and profiles are consistent and predictable for each application. The equipment is also designed to integrate robust cleaning protocols for post-etching. This allows for optimal process yield. Finally, the system includes a monitoring unit that allows for continuous monitoring of substrate temperature during exposure, post-exposure bake, etching, and cleaning. This real-time monitoring ensures optimal process control and performance. Overall, MICROTEC JWS LTC is an advanced photoresist processing machine designed to deliver precise lithography and etching results in the fabrication of semiconductor devices. The tool offers precise control of exposure parameters, high-resolution imaging, etching station, robust cleaning protocols, and real-time monitoring.
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