Used KARL SUSS / MICROTEC RC 16 (RC5) #9383649 for sale

MICROTEC RC16 (RC5) is a photoresist equipment that is used for patterning physical microstructures into thin films. This photoresist system features an in-situ pattern aligner to create defined microstructure patterns on layers that range from several microns to tens of nanometers. The photoresist unit is designed to provide high accuracy and repeatability, allowing for reproducible results. The pattern alignment accuracy is 0.3 microns across a 75mm chip field and its imaging resolution is 1 micron. The repeatability of the output is 0.3 microns, and the machine is capable of measuring samples with features ranging between 0.1 and 8 microns in size. The tool's photoresist layer thickness is between 20-180nm and is controlled by a precision shutter that is built into the asset. KARL SUSS RC16 (RC5) also includes features for batch processing to meet the needs of high-throughput applications. The equipment includes a top-down vision model which can acquire up to 25 images of microstructures at a time and a built-in database for storing acquired images. Additionally, automated spot mapping and global exposure are included for further efficiency and precision. KARL SUSS / MICROTEC RC16 (RC5) allows for both positive and negative tone development with a neutral release agent. The equipment offers four development methods; wet develop, solvent develop, dry develop, and post-exposure bake. The photoresist system is stable in temperatures ranging from 4-40 degrees celsius and it is designed to minimize contamination and minimize noise to ensure consistent, repeatable results. In summary, MICROTEC RC16 (RC5) is a photoresist unit that is used to pattern physical microstructure patterns with an accuracy and precision. Its features enable adjustment of the photoresist layer and its repeatability, and the machine offers batch processing features for high-throughput applications. Additionally, it offers both positive and negative tone development, with four development methods available, as well as non-contaminating temperature stability.