Used KARL SUSS / MICROTEC RC 16 #9383648 for sale

KARL SUSS / MICROTEC RC 16 is an advanced photoresist equipment best known for its use in a variety of semiconductor and MEMS fabrication processes. The system uses a polysilicon based "resist," that is exposed either to light or plasma, which causes chemical reactions to occur within the resist that form patterns in the resist layer. MICROTEC RC 16 unit works by exposing the resist layer to light or plasma through a specialized projection machine. The light opens the molecular structure of the resist allowing chemical reactions to occur in the resist layer. By controlling the light intensity or duration of the exposure the user can determine the pattern produced in the resist. During the preparation phase, the resist is cooled to a lower temperature and then applied to the substrate material. After the substrate is prepared the resist is exposed to light or plasma in order to initiate a chemical polymerization process. The rate and extent of the polymerization depends on the type of exposure, as well as the duration and intensity of the exposure. The exposure process results in the formation of an imaging pattern in the resist material which will serve as the basis for any further microfabrication. During the development phase the image is developed by the removal of the unexposed material through washing or etching. Once this process is complete, the substrate is ready for further microfabrication. KARL SUSS RC 16 is capable of producing micron and sub-micron lines and spaces with optical quality and high resolution images. The tool is also capable of achieving high throughput of substrates and high accuracy of exposures. The asset is versatile enough to be used for both sub-micron lithography and deep etch processes. Thanks to its state-of-the-art features, RC 16 is the ideal photoresist model for advanced semiconductor device fabrication.