Used KARL SUSS / MICROTEC RC 8 MS2 #9262863 for sale

KARL SUSS / MICROTEC RC 8 MS2 is a photoresist equipment designed for use in advanced lithographic processes. It is capable of developing photoresist layers up to 20 μm thick with rapid development time of just 60 seconds. The system is equipped with a heated vacuum chuck and automated exposure stages, allowing for precise control of resist thickness and critical dimension accuracy. The unit is designed for reliability to achieve highest quality photopatterns with a resolution well beyond that of standard contact printers. It is highly compatible with a wide range of photoresists; the focus-adjustment machine and auto-positioning stages on MICROTEC RC 8 MS2 ensure an accurate repetitiveness. The tool includes a top-loading spinner for spin-coating, and a motorized lift that maintains a constant resist thickness. KARL SUSS RC 8 MS2 also has an advanced control software and optimized user interface. All of these features, plus dedicated report generation, integration with SOPs, and other advanced lithography software, make this asset a powerful and reliable solution for those that need the highest performance and quality. RC 8 MS2 uses Electro Magnetic Interference (EMI) technology to accurately control the deposition process. This technology effectively controls the flow of electrons at high frequency and thereby prevents the resist layer from being damaged or destroyed during the development process. The model is also equipped with advanced software that enables predictive modeling of resist profiles, thus ensuring accuracy and repeatability of photopatterns. KARL SUSS / MICROTEC RC 8 MS2 is compatible with both liquid photoresists and thick film photoresists, and is suitable for production-level micro-structuring laser ablation and optical lithography. It is perfect for applications in the development of micro-electronic devices, MEMs, microlenses, nanowires, and more. MICROTEC RC 8 MS2 includes a large vacuum chuck that is able to accommodate photoresists up to 300 millimeters in size and offers a large temperature range of 25C° to 250C°. The equipment also includes a beehive chemistry module with up to four stations. Finally, the system has a touchscreen interface and automated environmental control, including cleaning cycle settings. In summary, KARL SUSS RC 8 MS2 is a reliable, high-performing photoresist unit capable of producing highly accurate and complex photopatterns with the highest resolution. It offers a wide range of features, including advanced control software, advanced EM radiation technology, automated exposure stages, predictive modeling capabilities and automated environmental control, making it the perfect solution for those who demand the highest quality photopatterns and resist profiles.