Used KARL SUSS / MICROTEC RC 8 MS3 #26117 for sale

KARL SUSS / MICROTEC RC 8 MS3 is a photoresist equipment featuring a modular design for the highest accuracy and repeatability. The system features a closed-loop stage movement, allowing for precise positioning and handling of a variety of substrates up to 200 mm. Its motorised actuation unit enables a long-term stability. Furthermore, its adjustable Z-axis allows for variations in substrate height for bumping and lithography processes. The machine features a high-performance, air-cooled Xe arc lamp with short warm-up time and low-vibration operation. Its specially designed condenser lens has a wide FWHM angle resulting in a uniform illumination of the substrate. The tool's high-resolution microscope with a magnification range of 7x to 100x and telecentric optics, delivers accurate alignment of the masks. Advanced process control, with a wafer-to-quantity screen, is available and user-controlled, providing real-time monitoring of the photomask and wafer alignment. The advanced metrology section with its highly sensitive optical univision head offers advanced process monitoring, while the software-programmable scan speed compensates for crosstalk between the UV lamp's output and the photoresist's exposure. The asset's integrated resist mixing station and electronics features fully automated resist mixing, dispensing and spin-coat performance control. MICROTEC RC 8 MS3 also features an auto-discharge unit for automatic and safe photoresist removal from the track and has automatic alignment capabilities for easy handling of different substrates. In addition, the model features laser safety features and temperature monitoring capabilities to ensure safe and reliable operating conditions. KARL SUSS RC 8 MS 3 also complies with international standards and environmental requirements, making it well-suited for most photoresist applications.