Used KARL SUSS / MICROTEC RC 8 #293767971 for sale

KARL SUSS / MICROTEC RC 8 is a high-precision photoresist system that is capable of creating highly accurate patterns with fine details. It is designed for a wide range of photolithographic applications, such as semiconductor maskmaking, printed circuit board (PCB) artwork, and optical component production. The machine is equipped with several components, allowing it to produce highly accurate and detailed parts. It includes two high resolution stepper motors that allow for precise movement of the substrate relative to the exposure source. The substrate is held in place using a vacuum table, which allows for exacting alignment of the substrate on the X, Y, and Z axes. The exposure source is a 150kHz mechanical shutter that provides uniform exposure to the substrate regardless of where it is placed on the vacuum table. The photoresist tank is specially designed to reduce air contamination for superior processing of photoresist materials. It has a silk-screen mesh base that is suitable for accommodating both regular and thick-film substrate in one holder, allowing for reduction in cycle time. MICROTEC RC 8 also features a nitrogen purge chamber that provides a highly controlled environment for the photoresist processing steps. KARL SUSS RC 8 is equipped with a PC-based process controller that facilitates precise and consistent processing. The user-friendly interface makes it easy to control the machine and its related parameters, such as exposure and development time, laser focus and intensity, humidity levels, temperature and vacuum conditions. This increased control translates to greater accuracy and finer details in the parts produced. The controller also offers built-in safety features to protect against damage to the exposure source, resulting in fewer maintenance costs. In summary, RC 8 is a versatile and precise photolithography system ideal for producing highly accurate parts with fine details. It is equipped with numerous features that enable it to deliver improved safety, higher throughput, and increased precision. This machine is a highly capable tool for photolithography and other related applications.