Used KARL SUSS / MICROTEC RC 8 #9015890 for sale

KARL SUSS / MICROTEC RC 8 is a photoresist equipment that enables the fabrication of highly complex microelectronic parts and structures. The system is based on a stepped grayscale (SGS) imaging technology, which uses light interference to expose the resin or resist material with a complicated set of grey tones to achieve a precise pattern. MICROTEC RC 8 is designed to work with a wide range of photoresists. It can be used with standard negative or positive photopolarized films, as well as liquid-jet and dispensed resists. Additionally, the unit uses a low-temperature process to apply the resist to the substrate, ensuring the resist's polymer and adhesion properties are intact. The machine utilizes a direct-write lithography head which delivers a gamma irradiance of 300 W/cm2, with a spatial resolution of down to 5µm. KARL SUSS RC 8 supports substrate sizes up to 400 x 400 mm and offers a working range of -3 to +25 mm in Z-axis resolution. The imaging process involves 4 stages: pre-exposure, post-exposure, etching and baking. These stages are managed by a user-friendly graphical interface. RC 8 can achieve both high accuracy and speed in its operation. It is capable of processing up to 3000 wafers/hour and automatically adjusts the irradiance and exposure times for optimum results. The tool will also identify and eliminate defects in order to ensure a high yield rate from the photomasking process. In addition, KARL SUSS / MICROTEC RC 8 has a variety of advanced features, such as temperature compensation and beam shaping for highly accurate exposure control. The asset also supports advanced non-contact resistances for extremely thin layer resist application. MICROTEC RC 8 is a comprehensive photoresist model which provides remarkable results for complex microelectronic fabrication. It is an ideal solution for high-end microelectronics production, and its innovative design and features ensure a reliable yield.