Used KARL SUSS / MICROTEC RC 8 #9207171 for sale

KARL SUSS / MICROTEC RC 8 is a photoresist equipment, specifically designed for use in the production of high-resolution microstructures and integrated circuits. This system uses a single resist layer that is exposed to ultraviolet (UV) light to create an electron beam resist image. This device is capable of producing high-resolution patterns with sub-μm feature size on wafers up to 8" in diameter with a resolution of 5 μm. MICROTEC RC 8 unit is designed to allow for both non-contact and contact exposure modes. In the non-contact mode, the sample is held in place during resist exposure using a vacuum chuck. An electron beam is then used to program the appropriate geometries onto the resist surface according to a loaded pattern. In the contact mode, a stencil-like resist mask is used to expose the wafer surface. In terms of accuracy, this machine has a feature size resolution of 5 μm and can expose patterns down to 10 μm exposure line lengths. The tool also includes a Hotplate with maximum temperature of 250°C. This allows for an optimized process for pattern transfer from the resist layer onto the underlying material. Additionally, the asset can also be operated in air, nitrogen, or vacuum. This enables chip producers to reduce the generation of contaminants during the fabrication process. KARL SUSS RC 8 model is equipped with multiple safety features which make it user-friendly and safe to use. It has a protective housing that shields the user from UV light, an interlock to prevent accidental exposure to UV light, as well as an alpha source that helps to determine the blocking area of the pattern when the image is exposed. Additionally, the equipment can be used with various resist materials and is easy to clean between batches of wafers. Overall, RC 8 system is capable of producing high-resolution patterns on wafers with feature size resolutions down to 5 µm. It is also equipped with multiple safety features and is easy to use. With its wide range of capabilities, the unit is ideal for use in the production of high-resolution microstructures and integrated circuits.