Used KARL SUSS / MICROTEC RC 8 #9365908 for sale

KARL SUSS / MICROTEC RC 8 is a photoresist equipment that performs critical etching and lithography processes on a variety of film and photomask substrates. This system uses rigorous photographic processes to contour patterns onto thin film layers that can be applied to a variety of substrates for integrated circuit applications. Specifically, it can handle substrates up to 400 mm in diameter and can be equipped to process a variety of specialty resist materials such as AZ, GX1, GX2, and PFE. The unit uses a highly accurate alignment machine in order to ensure tight registration of patterns across substrates; including a 16 point autofocus tool that can be used to assist in positioning and shaping of resist patterns onto intricate substrate surfaces. Additionally, the asset is designed to utilize two substrate movement levels which aid in providing precision for in-field registration. The model enables direct write laser lithography which is particularly useful for quickly rapidly creating complicated patterns with high precision. Additionally, it is optimized for aggressive ashing and etching processes such as Dry etch, wet etch, and deep reactive ion etching. In addition to the direct write laser lithography, the equipment is capable of working with a wide variety of photomasks that can be utilized to expose patterns directly to substrate surfaces. This allows for more detailed and intricate patterns to be created with greater precision than can be achieved by direct laser lithography. MICROTEC RC 8 is capable of both high-functioning and low-cost processes. It is designed for low electrical and thermal loads, meaning KARL SUSS RC 8 can be used for both quick prototyping and efficiently mass production of high quality and intricately detailed patterns. Additionally, its 5µm accuracy ensures that patterns can be replicated with close tolerances that remain consistent over multiple usage cycles. Overall, RC 8 is designed to enable photoresist etching and lithography processes with intricate precision for a variety of integrated circuit applications. It is capable of exposing patterns to the substrate surface with precise registration, making it useful for mass production of intricate patterns with consistent quality.