Used KYOWA RLE-52ES #9393172 for sale

KYOWA RLE-52ES is a photoresist lithography equipment that utilizes a light source to cast a projection of an image or coil onto a substrate for various printing and manufacturing purposes. This system is suitable for a wide range of demanding applications including PCB fabrication and optics. This high-precision tool can submit patterns to a sub-micron level resolution for precise and accurate production. Furthermore, the unit provides superior resolution and uniformity with its swift and steady illumination capabilities combined with advanced scanning technology. RLE-52ES light source has been determined to be maximum efficiency and is fiber optic compatible. It consists of two arc lamps with a high current power supply, while another power source provides light for the uniform illumination section. Additional lighting options like UV for wavelength sensitivity allow for a broader range of pattern design possibilities. The machine is equipped with an automated stage control with a large scanning area for a wide variety of substrates. An improved resolution, accuracy, and repeatability provide higher performance and efficiency. The center of the exposure area is aligned by X, Y, and θ axis and is easily adjustable due to an advanced auto correction tool. The photoresist in KYOWA RLE-52ES is highly important as it allows for the appropriate exposure time needed for the formation of patterns. The asset's virtual alignment systems ensure precise alignments by comparing the exposure areas center pattern to the design being exposed, guaranteeing a completely accurate process. The alignment model also can reduce the occurrence of misalignment during process, increase yield, and optimize process performance. As an important component of photolithography, developers must also consider defect levels within substrates. The RHS-SAF51 and its complementary systems detect and classify defects while the light sources and automated features of the equipment can control the detectability of defects in substrates. Furthermore, RLE-52ES features optimized recipe creation options for enhanced defect control and exact determination of the critical dimension (CD) areas. Overall, this system provides its users with a versatile and accurate means of lithography for a range of uses. Its high quality resolution, automated features, and defect control components allows for a wide range of applications and a quick and precise manufacturing process.