Used LAURELL 650M #9409668 for sale

LAURELL 650M
Manufacturer
LAURELL
Model
650M
ID: 9409668
Spin coater.
LAURELL 650M photoresist equipment is a high-level automated machine used for a variety of industrial processes, such as resist coating and wet processing. The system offers excellent patterning capabilities, with a minimum feature size of 1 micron. Furthermore, the controllable temperature range of the unit — between 0°C and 50°C — makes this machine well-suited for high-definition, high-precision projects. Consisting of a nitrogen-inerted work chamber, an integrated 4-position hot plate and an 8-inch photomask, 650M tool is designed to meet the demands of various production applications. Additionally, this asset has a built-in conveyor model and is compatible with multiple photoresist and mordant materials. The equipment includes a film transport belt that allows for continuous processing of several wafers or substrates at the same time. In terms of speed and efficiency, the system's ability to process up to 300 wafers per hour with up to 42 stations is a major benefit. Additionally, the capability of LAURELL 650M to operate in a completely inert, nitrogen-filled environment eliminates the risk of water and air contamination, making it a great choice for cleanroom operations. In order to ensure quality, 650M comes equipped with a variety of sensors and accurate control systems. The unit utilizes PLC technology to monitor all areas of the process, such as pressure, temperature, and rates of film deposition. In addition, it also has sophisticated computer controls that permit closed-loop control and extensive data logging capabilities. Furthermore, LAURELL 650M features easy operation with its convenient touch screen interface and ethernet connection for remote monitoring and control. The machine also offers excellent flexibility, with several options for material holders, nozzles, and other accessories. To sum up, 650M photoresist tool is an advanced industrial process automation solution. It is incredibly reliable and powerful, capable of processing up to 300 wafers an hour with excellent control of film deposition rates and pressure levels. Additionally, its built-in sensors, PLC technology, and data logging abilities, as well as its compatibility with multiple materials, make it a great choice for high-precision, high-definition applications.
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