Used LAURELL EDC-650HZB-23NPPB #9397753 for sale

LAURELL EDC-650HZB-23NPPB photoresist equipment is an advanced machine designed for developing high quality photomasks used in the microelectronics industry. This machine can create masks with extremely high resolution and excellent line layer accuracy, perfect for advanced chip manufacture. LAURELL EDC 650 HZB 23 NPPB utilizes state-of-the-art photoresist processing technology with its automatic substrate handling and closed loop process control system. The advanced design helps ensure that each mask has uniform features, excellent patterns, and uniform line widths. This unit also provides excellent linearity and low scatter for consistent processes. The photoresist machine has a dual-zone heated cassette that provides higher throughput and better precision when handling multiple substrates. The use of bidirectional transport helps make sure the resist is spread evenly across the substrate surface. The cassette also has a series of pressure sensors so that it can efficiently measure the thickness and spread of the resist layer. In addition, EDC-650HZB-23NPPB photoresist tool has a high-resolution camera for mask inspection. This camera is able to detect small defects, such as particles and scratches, so that defects can be avoided. It also provides real-time imaging feedback to the user to ensure accuracy in the development of photomasks. For more comprehensive process control, the asset has a comprehensive software suite. This software not only automates mask-making processes, but also provides users with easy access to all relevant data needed to optimize their processes. In conclusion, EDC 650 HZB 23 NPPB photoresist model is an excellent choice for the microelectronics industry. With its advanced photoresist processing technology, high-resolution camera, and effective software suite, it is an ideal machine for developing advanced photomasks for chip manufacture.