Used LAURELL WS-400B-6NPP #293822285 for sale

LAURELL WS-400B-6NPP is a benchtop photoresist processing equipment that is suitable for many electro-optic processing applications, such as thin-film deposition, etching, insulation lamination, and photoresist coating. This advanced all-in-one system is designed to provide users with superior performance and tight process control. It features a featured temperature-controlled platform, a powerful 6kV power source, and a 4-zone diffuse illuminator. The temperature-controlled platform has a large processing chamber that can reach temperatures up to 80°C, and can be set to within 1° accuracy for precise handling of delicate photomasks and resist layers. The 4-zone diffuse illuminator can be set to achieve illumination levels from 25 to 75 W/cm2 while still providing even illumination across the entire surface of the photomask or wafer. This allows for more uniform, consistent lithographic exposure of the resist layer. Additionally, the illuminator can be adjusted in minute increments for fine-tuning of the lithography process. The power source in WS-400B-6NPP has a maximum power output of 6kV. This allows for the deposition of conformal thin films or the formation of well-defined etching patterns on the wafer or photomask, while still preserving tight process control. With its 6kV power source, LAURELL WS-400B-6NPP can be used to etch deep trenches and features in order to accurately produce structures such as microfluidic channels. Additionally, the unit is equipped with a proprietary laser-induced temperature control (LITC) machine that measures the precise temperature of the photoresist during the lithographic process in order to minimize thermal drift and ensure optimal lithography results. Also included is an automated resist coating tool that allows for uniform dispensing of the resist layer onto the wafer or mask. This ensures accurate and consistent results, and minimizes variations due to manual dispensing of the resist. Overall, WS-400B-6NPP is an advanced and versatile asset that is suitable for a wide range of different photoresist processing applications. Through its precise temperature control, 6kV power source, 4-zone diffuse illuminator, and automated resist coating model, users can achieve accurate and consistent lithography results while achieving tight process control.