Used LAURELL WS-650HZB-23NPP/UD3 #9397755 for sale

LAURELL WS-650HZB-23NPP/UD3 is a high-performance photoresist equipment designed for critical production applications in the chemo-mechanical polishing (CMP) process. This system is designed to improve process consistency and yield while reducing process development times. It utilizes wet/dry stages with an adjustable vacuum, as well as a heated substrate table to maintain a uniform temperature during processing. The WS-650HZB-23NPP/UD3 utilizes proprietary photo-resist technology and a mechanical platform to facilitate highest repeatability and accuracy of polishing results. The internal chamber is pressurized to a documented level and has low particle generation during operation. It has an adjustable vacuum and augmented buffer solution, to ensure the highest quality photoresist results on the substrate surface. The WS-650HZB-23NPP/UD3 also has a highly reliable and accurately regulated Photoresist Dispenser unit, allowing for precise independent control of the resist material feed rate, concentration and viscosity for each substrate. Additionally, the machine offers a spin rinse dryer that performs a final cleaning, rinsing and drying processes before the polished substrate is unloaded. The WS-650HZB-23NPP/UD3 photo-resist tool is user friendly, with intuitive screens, graphical menus and simplified control systems. A temperature probe inside the process chamber can monitor both substrate and resist temperatures at all times. This probe is designed to maintain accurate resist film thickness and temperature to assure highest product quality and consistency even at high throughput rates. The application range of photoresist technology is made possible by the exceptional hardware accuracy provided by the WS-650HZB-23NPP/UD3 unit. This unit can handle a wide range of substrates and various polishing techniques with remarkable repeatability and accuracy. This asset is an ideal choice for high-end CMP applications requiring a high degree of detail, precision, and consistent results.