Used LEYBOLD APS 1104 #9092775 for sale

LEYBOLD APS 1104 is a photoresist equipment specifically designed to provide users with a complete, accurate workflow for lithography processes. The system is composed of a set of tools which allows users to accurately model exposure and develop lithography processes in a any desired setting. At its core, APS 1104 uses a 4-step process to prepare wafer surfaces. First, the wafer is exposed to a light source capable of generating both ultraviolet (UV) and deep ultraviolet (DUV) light. This exposure both hardens and sensitizes the photoresist. Secondly, the photoresist is developed in a developer bath to expose the underlying substrate. Thirdly, the wafer is subjected to a wet etching process to define the exposure pattern. Finally, the wafer is subjected to a post-processing etching, during which the exposed pattern is converted into the desired 3D profile. The unit also boasts a number of impressive features, such as its advanced optical imaging machine, which can detect far-field non-linearities as small as 10nm. This tool helps to reduce contamination of the photoresist and works together with the motion asset to adjust the focus of the light in order to accurately expose the entire field of view. LEYBOLD APS 1104 can also process up to 1000 wafers per hour, ensuring that development times are a maximum of 20 minutes per pattern. Its low temperature operation, coupled with its digital temperature controller and thermocouple ensures that the photoresist layer is not damaged during the process. APS 1104 has a high degree of accuracy, which is enabled in part by its high precision stepper controller and piezoelectric transducer. The model also features an intuitive user interface, as well as a variety of debugging tools, enabling users to quickly and easily model photoresist processes. Overall, LEYBOLD APS 1104 is an excellent choice for a photoresist equipment. It is highly accurate and efficient, making it a perfect choice for the development of lithography processes.