Used LEYBOLD APS 1104 #9192878 for sale

LEYBOLD APS 1104 Photoresist Processing Equipment is a multi-functional and fully automated system used in photolithographic processes. It is specifically designed to handle and develop various types of photoresists with optimal results. APS 1104 unit offers a complete control of all the parameters that influence the final product, such as temperature, humidity, dew point, surfactant concentration, and exposure time. LEYBOLD APS 1104 consists of a process chamber, a control unit for setting up and controlling the process parameters, and a development tank. The machine is equipped with two independent solenoid valves, one for the solvent and one for the surfactant, enabling different ratios and concentrations of the two liquids to be used at any given time. The load port contains a highly accurate chamber temperature sensor, which enables precise control of the temperature inside the process chamber. This is important as the photoresist's properties can be significantly altered due to temperature changes and therefore, controlling the temperature is essential for achieving consistent and reproducible results. The chamber also contains a solvent and surfactant delivery tool. The asset is designed to give variable and accurate dispensing of solvent and surfactant, enabling the user to control the mix according to their specific needs. After loading, the chamber is evacuated, and a vacuum is generated by an adjustable, pressure-controlled pump. By controlling the vacuum in the chamber, it is possible to uniformly distribute the mixed solvent and surfactant throughout the chamber. The user can configure the exposure time, with a maximum of 99.99 seconds, and the exposure wavelength. The exposure wavelength can be selected according to the specific photoresist being used and the desired results. The model also includes a hotplate with adjustable temperature. This can be used to generate heat, which helps to accelerate the photoresist's curing process. The hotplate also features a forced air cooling equipment which prevents hot spots during development. Finally, APS 1104 includes a development tank, equipped with a magnetically coupled stirrer. This ensures homogeneous and consistent development of the photoresist. After development, the photoresist is rinsed and dried using a programmable, adjustable media nozzle. This helps to ensure that the photoresist is dried without overheating or over-drying. LEYBOLD APS 1104 is therefore ideal for large-scale production of photolithography products.