Used LEYBOLD HERAEUS A 1100 #9109459 for sale

LEYBOLD HERAEUS A 1100
Manufacturer
LEYBOLD HERAEUS
Model
A 1100
ID: 9109459
System E-gun ES V-6 Meissner trap Polycold.
LEYBOLD HERAEUS A 1100 is an advanced photoresist development equipment used for fine lithography processing. The system is designed to produce high-accuracy features with extreme repeatability. LEYBOLD HERAEUS A1100 unit features a scanner with an optical element called the exposable wavelength range (ER) that operates at an adjustable speed of up to three thousand microns per second. It is capable of controlling and adjusting the angle of illumination, the focus, the exposure duration, and the shutter speed. It features precise alignment for beam overlap, allowing the machine to produce advanced patterns with high accuracy and narrow line width. The tool is capable of working on different substrates of varying sizes and shapes. The asset also features computer-controlled alignment by using a laser alignment model that is safe and accurate. The equipment can be configured for either manual or computer-controlled alignment, allowing for higher levels of automation. This system is ideal for wafer lithography due to its precise beam overlap over large areas. A 1100 unit uses a two-step development process for photoresists. The first step is the exposure of the photoresist to a radiation source, either UV or x-ray, depending on the given requirements. Through this, the exposed part of the photoresist material is hardened. The second step of the development process involves the use of a developer liquid. This developer liquid dissolves the non-hardened part of the photoresist, but leaves the hardened part undamaged. In this way, the user is able to create patterned photoresist surfaces that accurately reproduce the proposed pattern. A1100 machine has numerous features and advantages. One of the most important advantages is its capability to produce highly detailed photomasks with extremely precise features. Moreover, the tool is capable of automatically aligning elements for accurate masking and direct exposure of the substrates. With fast and robust processing capabilities, the asset is suitable for high-volume production operations. All these features make LEYBOLD HERAEUS A 1100 model an ideal process for photolithography.
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