Used LEYBOLD HERAEUS ARES 1100 #9054497 for sale
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ID: 9054497
Pump
Rotary / Roots / Diffusion
Meissner and Polycold
Mark II Ion source
Single e-gun with 8-hearth crucible
Quartz crystal monitoring
Segmented dome substrate carrier.
LEYBOLD HERAEUS ARES 1100 is a piece of high-precision micro-machining equipment used in fabrication processes such as photoresist processing. The equipment delivers high-precision etching and deposition capabilities, as well as accurate over-coating processes. ARES 1100 system utilises a photoelectrical control unit and is able to etch and coat a wide range of substrates. It has the capability to process substrates up to 4.7 inch in size and with side length of up to 20 mils. The machine comes with an integrated automated wafer handling tool and also features a closed loop photomask evaluation asset. LEYBOLD HERAEUS ARES 1100 uses the company's unique optically-enhanced muddled vapor deposition (OMVD) process to etch and coat materials. This is a unique etching and deposition technology that enables the accurate depositing of specialized thin films in a variety of micro and precision machining applications. The model comes with an advanced optical control equipment to ensure precise and accurate etching and coating tolerances. The system also comes with a variety of other features such as customised photomask designs that can be used to etch exquisite complex patterns on substrates. It also offers an air-flow option that can be used to clean substrates and prevent contamination during the etching and deposition processes. ARES 1100 unit is also able to measure real-time characteristics during the etching and deposition processes, allowing for faster turnaround and high-quality machine performance. The tool is rated to process up to thirty wafers per hour with features such as precision temperature control. In conclusion, LEYBOLD HERAEUS ARES 1100 is an advanced precision machining asset used for photoresist processing and other etching and coating applications. The model offers highly accurate over-coating, depositing and etching capabilities, as well as automated wafer handling. The equipment is also able to measure real-time characteristics during the etching and deposition processes, allowing for faster turnaround and high-quality results.
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