Used LEYBOLD HERAEUS Syrus 1105 #293819408 for sale

LEYBOLD HERAEUS SYRUS 1105 is a digital photoresist equipment designed for the micropatterning of small components such as semiconductor chips and optical devices. The system features an advanced control interface, allowing for precise control of exposure parameters in order to produce high-resolution patterns of the finest detail. The unit includes a motorized wafer stage which can support up to 8-inch wafers with up to 8 levels of sensitivity. The stage is mounted on an XYZ platform and can be configured to rotate the coated wafer in order to expose the photoresist to the desired patterns. An on-board touch screen allows for precise inputting of parameters and enables the adjustment of X, Y and Z axis settings, exposure time, energy settings and UV energy settings. SYRUS 1105 employs an advanced imaging machine to ensure precise exposure times and patterning accuracy. The tool features an integrated CCD camera with up to 5 Megapixel resolution which can be used for precise positioning of the wafer and imaging of the patterned areas. The camera is mounted on an automated theta-axis, allowing for precise angular alignment of the imaging asset relative to the rotating wafer. The model also includes an optional laser alignment equipment to ensure accurate pattern alignment on the coated wafer. The system is highly automated, with control of the wafer stage, exposure time, energy settings and UV energy settings. A built-in vacuum unit securely holds the wafer in place during the exposure process and ensures a consistent pressure contact between the wafer and the photoresist. Finally, the machine is equipped with a safety tool to protect personnel and equipment. This asset is designed to shut off the exposure process when a sudden emergency is detected. Overall, LEYBOLD HERAEUS SYRUS 1105 is an advanced digital photoresist model designed for precision micropatterning of small components. The equipment provides for precise control of exposure parameters and automated wafer movement, enabling the production of high-resolution patterns of the finest detail. Additionally, safety systems are in place to protect personnel and equipment.