Used LEYBOLD OPTICS CCS 250 #9402418 for sale

LEYBOLD OPTICS CCS 250 is a world-leading photoresist equipment designed for the fast and accurate development of photoresist processes. Photoresist technology involves light exposure to create patterns in the substrate material, commonly used in the manufacturing of microelectronics and other sensitive components. CCS 250 incorporates advanced light exposure technology and is equipped with a series of lenses and other optics for the exacting development of photoresist processes. LEYBOLD OPTICS CCS 250 offers unparalleled speed, accuracy and resolution, enabling it to quickly and accurately develop photoresist patterns with a very high degree of repeatability. The system is also optimized for the development of low-threshold switchable surfaces and magnetic prints, making it a great choice for the manufacture of ultra-precise components. CCS 250 also offers sophisticated automation capabilities, allowing users to set up a process quickly and easily. The unit is connected to a computer interface which is able to manage pattern parameters, providing users with a comprehensive overview of the development process. The software allows for the easy optimization of parameters such as exposure time, intensity, focus, and shutter speed, allowing for quick batch processing of photoresist patterns. The machine also incorporates a highly accurate and efficient imaging subsystem, allowing for the fast capture of patterns from a wide range of substrates. The imaging subsystem is connected to an image analyzer, enabling high-level pattern debugging to ensure that all processes meet the exacting requirements of the customer. LEYBOLD OPTICS CCS 250 is an extremely reliable and high-performance photoresist tool. It provides users with a fast and efficient way to develop photoresist processes with a high degree of accuracy, repeatability, and resolution. The sophisticated imaging asset and software control capabilities combine to make it a great choice for those looking for the ultimate in photoresist performance.