Used LITHOTECH DB-50-W #293605803 for sale

LITHOTECH DB-50-W is a superior photoresist equipment which is designed for advanced lithography and other advanced processes used in micro-electronic manufacture. It is a comprehensive system which consists of several components. These components have been carefully selected and formulated to produce a strong and reliable protection against lithography chemicals and radiation from exposure systems used in chip production. The unit includes a photoresist film which is used as a protective layer over the substrate during exposure. The film is deposited on the substrate and is then exposed to a light or other beam of radiation. When exposed, this film is hardened and can provide a reliable protection against lithography chemicals and exposure to radiation or other forms of energy during chip production. The machine also includes a developer solution which is used to remove the hardened photoresist from the substrate after the exposure process is completed. This developer solution can be heated or treated to further make the removal process easier and faster. The solution can also be used to protect sensitive components on the substrate during the exposure process. The tool is provided with a range of additional components which help optimize the photoresist asset to provide the optimum protection. These components include antistatic agents, light blocking agents and transparent polymers which protect the substrate from the elements during the exposure process. The model also includes chemical agents which are designed to improve the security of the substrate by protecting against the effects of chemical reaction. The chemicals are formulated to ensure that they remain effective even in hostile environments and will not react with the components on the substrate during the process. The overall equipment is engineered to provide maximum protection from the exposure to both chemical and radiation, while remaining cost effective and easily deployable. The system also provides a high degree of flexibility, with the ability to customize the photoresist unit to the specific needs of the chip production and can also be used to further fine tune the photoresist protection for the production process.