Used LUNG PIEN LP-1800 EBA #293642698 for sale

Manufacturer
LUNG PIEN
Model
LP-1800 EBA
ID: 293642698
Vacuum coater Diameter size: 1800 mm Fixture size: 1600 mm Ultimate vacuum: 10^-7 Torr / 10^-5 Pa Maximum substrate temperature: 350°C Cooling water flow: 180 Liters/min Grounding resistance: <5 Ohms Air compressor: Pneumatic: 8 Kg/cm² Exhaust system: Rotary pump: 6,000 Liters /min Strengthen pump: 2,600 M³/hour (2) Diffusion pumps: 45,000 Liters/sec Ultra low temperature freezers: -110°C~ -140°C Heating system: Micro heater: 42 kW Film thickness gauge: Optical film thickness meter: LP Film thickness meter wide Quartz film thickness meter: Monolithic sensor head / six sensing head Vacuum gauge: Pirani+Cold cathode (1ATM~ 10^-9 Torr / 1ATM~ 10^-7 Pa) Evaporation source: JEOL / PLASMATECH Electron gun, 6 kW / 10 kW / 15 kW Resistance heating: 6 kW Cooling system: Pressure: 4 Kg/cm² Pressure: 2 Kg/cm² Power supply: 110 kW.
LUNG PIEN LP-1800 EBA is an advanced photoresist equipment built for high quality and production efficiency. It is a self-contained unit that consists of an evacuable photoresist processor, defectivity monitor, and sensors and data acquisition electronics. The LP-1800 processor provides consistent processing parameters while endowing high precision process control. The defectivity monitor system is equipped with a large HD color LCD display, allowing real-time observation of defects to facilitate in-line fault detection and analysis. The unit employs an advanced resist stripping technology for pre-dry processes that make it suitable for a wide variety of photoresist materials. Advanced features such as a feed-forward control machine, high process speed settings, and laser height and film thickness monitoring further ensure the highest quality and precision. LP-1800 EBA also offers comprehensive instrumentation including temperature, force, pressure, vacuum, and particle monitoring, providing accurate and reliable data. In addition, LUNG PIEN LP-1800 EBA also features an integrated feedback control for uniform batch processing and automatic test stop capability for immediate problem resolution. The tool also features high integration of automation, allowing users to easily program their own resist processes, as well as user friendly touchscreen controls to facilitate programming and optimization of different process steps. LP-1800 EBA is ideally suited to support advanced process technologies such as photoresist laser ablation and lithography. Its performance and advanced features make it an excellent choice for fabrication facilities wishing to ensure consistent processes, as well as high quality and high-yielding production.
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