Used M&R AGS-1008SDFT #9238807 for sale

M&R AGS-1008SDFT is a state-of-the-art photoresist equipment created with the intention of simplifying photolithography. It is ideal for use in the fabrication and development of textured thin films, optical materials, and microelectronic components. AGS-1008SDFT is comprised of a series of components including a photomasker, an exposure system, and a developer. The photomasker is designed to be easy to use and enables the user to precisely define pattern geometry. The exposure unit utilizes high intensity light, ensuring a uniform and consistent exposure of the resist material. Finally, the developer allows the user to etch and shape resist materials in a timely and efficient manner. The machine has been designed to provide superior performance and improved throughput over other photoresist systems. The tool has a maximum exposure resolution of 0.5 microns and can develop layers as thin as 0.5 microns. Furthermore, the asset can create patterns at variable aspect ratios, allowing for detailed and complicated design features. M&R AGS-1008SDFT can support a wide range of light sources including ultraviolet and visible light sources. AGS-1008SDFT has been designed to be user friendly with an intuitive graphical user interface and is easily portable. To ensure optimal results, the model boasts high-precision components and can be calibrated for precise exposure times. The equipment also offers built-in features for data management, helping to reduce errors in processing. Overall, M&R AGS-1008SDFT is an ideal choice for photolithography in modern fabrication. Its superior performance, features, and portability provide state-of-the-art solutions for the development of thin films, optical materials, and microelectronic components.