Used M-SETEK VL-6000 #9148407 for sale
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M-SETEK VL-6000 Photoresist Equipment is a unit manufactured by M-SETEK, a leading mask fabrication equipment manufacturer. This system is used in the fabrication of semiconductor devices, which require precision patterns of various materials to be exposed to an applied light source. VL-6000 features an advanced set of photolithography capabilities to achieve incredibly precise pattern imaging. M-SETEK VL-6000's core device is a precision XY stage, containing high-precision, low-distortion linear assemblies. This device allows very precise alignment of the substrate and the optical beam, enabling the user to produce ultraaccurate images and patterns. The device also features a heated chamber to keep the photoresist in a uniformly melted state during the optical imaging process, providing exceptionally well-defined patterns. The unit also comes equipped with several accessories, the foremost being a motorized, synchronized shutter. This allows the user to precisely control the amount of exposure time with each shot, ensuring only the target pattern is exposed to the light source. The machine also comes with a high-precision laser interferometer, enabling the user to laser-calibrate the position of the substrate stage for ultimate accuracy. VL-6000 also includes a sensor-equipped resist housing. This contains sensors that detect changes in the resist's temperature and viscosity, allowing the user to adjust parameters if needed during the process. In addition, the tool comes with a high-resolution imaging camera, enabling the user to inspect and verify the results of each shot. M-SETEK VL-6000 is also equipped with powerful software to control all of its functions. This allows the user to setup and execute a series of shots with ease, with a single keystroke launching the entire imaging process. In summary, VL-6000 Photoresist Asset from M-SETEK is an advanced, multi-functional photolithography model designed for the fabrication of high-precision semiconductor devices. The equipment features a precise XY stage, a heated chamber, a synchronized motorized shutter, a laser interferometer, and advanced resist monitoring sensors, as well as a high-resolution imaging camera and an intuitive software platform.
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