Used MICRO PROCESS Avenger Ultra-Pure 8 #9229851 for sale

MICRO PROCESS Avenger Ultra-Pure 8 is a state-of-the-art photoresist equipment designed to enable users to quickly and accurately produce intricate structures on semiconductor wafers. The system works by exposing a photoresist material to high-energy light, such as laser, which selectively alters the resist characteristics on the wafer. This in turn allows the user to precisely control the patterning of a substrate's micro-circuits. The unit consists of a series of components including a beam source, a scanning head, a controller, a work table, and an exposure chamber. The beam source is used to generate a monochromatic light beam of a specified wavelength. This beam is then scanned across the surface of the wafer by the scanning head, which contains an array of lenses and mirrors that focus the beam onto the wafer. The controller module coordinates the movement of the scanning head and provides feedback on the exact position of the beam. The work table is where the wafer and substrate to be patterned are placed before they are loaded into the exposure chamber. The exposure chamber provides a controlled environment for the exposure, and can be set to a range of parameters including intensity, duration, temperature, and pressure. Once the patterning is complete, the wafer is unloaded via a vacuum machine, and the data is processed by the controller. Overall, Avenger Ultra-Pure 8 provides a comprehensive solution for semiconductor patterning, with streamlined operation and easy integration into existing systems. The tool is extremely accurate, with an unsurpassed resolution of 10nm, and is capable of producing precise microscale Circuitry for a wide range of applications. Thanks to its high-precision capabilities and intuitive user interface, MICRO PROCESS Avenger Ultra-Pure 8 is an ideal choice for semiconductor patterning.