Used MIKASA 1H-D2 #9393317 for sale

MIKASA 1H-D2 is a cutting-edge photoresist equipment designed to provide superior performance in challenging lithographic applications. Photoresists are materials that are used in the fabrication of integrated circuits, and are exposed to light using a lithographic projector. Depending on the exposure, the resist material will be either selectively etched away or remain, resulting in complex patterns that form the basis for circuit components. 1H-D2 provides superior patterning fidelity compared to traditional photoresists in demanding photolithography applications. MIKASA 1H-D2 consists of two main components: a light-sensitive resist material, and a pattern process. The light-sensitive material is made of a polymeric binder with a variety of additives which react to different wavelengths of light. When exposed to the light source, the part of the resist that is exposed will harden, while the uncured parts of the resist will remain soft. This allows for the etching of components or patterns to produce intricate patterns and structures. The pattern process of 1H-D2 system consists of a series of steps where the resist is exposed, developed, and post-treated. During the exposure process, the resist is placed on the lithographic projection lens and is exposed to the light source passing through the lens. After exposure, and depending on the exposure time, the exposure areas of the resist will harden and those areas that remain soft can be selectively removed using a chemical etchant. After this step, the chemo-mechanical development process takes place, which removes unreacted portions of the resist using a combination of chemical and mechanical methods. Lastly, the post-treatment step takes place, where any remaining soft resist is removed with another chemical or mechanical method. The advantages of using MIKASA 1H-D2 photoresist unit include increased resolution over traditional photoresists, as well as decreased wafer loss and development time. The improved resolution of the resist helps improve the patterning process and reduces the costs associated with the device fabrication. Additionally, wafer loss and development time are decreased due to the ability to selectively treat areas of the resist, eliminating areas that are not required for the device design. In conclusion, 1H-D2 is a cutting edge photoresist machine that provides superior resolution and performance in lithographic applications. The improved resolution helps improve the device fabrication process, and the decreased wafer loss and development time make the overall production process more efficient.