Used MIKROMAT 20 V #9066853 for sale

MIKROMAT 20 V is a precision photoresist equipment designed for processing and patterning advanced opto-electronic, microelectronic, and microstructure-based components. It offers high levels of accuracy and precision, allowing for precise patterning of components without compromising the resolution of the components. The system utilizes a vertical stage, allowing for the scanning of an entire substrate in one single plane, and a xenon arc lamp for optical exposure. 20 V is equipped with a highly-resolved imaging unit, allowing for resolution of up to 0.1 µm. The imaging machine includes a three-axis servo tool for precise positioning and patterning of components. In addition, it also includes a vacuum-sealed chamber that ensures uniform exposure and processing of parts. The asset offers several features that provide enhanced performance and precision to the user. These features include a rapid speed of processing for short exposure times, a dynamic focus regulation, as well as a motorized translation mechanism and an in-situ metrology model. Additionally, the equipment offers an in-plane alignment system that allows for the adjustment of pattern size and position. MIKROMAT 20 V also features touch sensor technology, which allows the unit to detect and control the position of the substrate through contactless sensing. This allows for the precise manipulation of the substrate, helping to increase the quality and accuracy of the components. Finally, 20 V includes a temperature-controlled machine for photoresist processing. The tool is designed to allow for the production of components that can withstand extreme temperature conditions, allowing for exceptionally uniform and accurate results. The temperature-controlled asset also helps to control the baking time for semiconductor components. In summary, MIKROMAT 20 V is a state-of-the-art photoresist model designed to produce high-precision and high-resolution components. The equipment features a highly-resolved imaging system, a vacuum-sealed chamber, touch sensor technology, in-plane alignment unit, rapid speed of processing, dynamic focus regulation, motorized translation mechanism, in-situ metrology machine, and temperature-controlled tool for photoresist processing.