Used MITOMO SEMICON ENGINEERING MP-1408JSE #9280830 for sale

MITOMO SEMICON ENGINEERING MP-1408JSE is a full-featured photoresist equipment designed for patterning the surface of semiconductor substrates. This system utilizes pulsed ultraviolet light to irradiate photoresist on the substrate, allowing users to control the chemical composition of the photoresist and leverage its photochemical properties to pattern the surface of the substrate. The unit is comprised of three main components - an exposure-machine, a coating-tool, and an irradiation-asset. MP-1408JSE's exposure-model is a multi-stage digital tablet device that can control the ultraviolet exposure intensity, wavelength, and pattern on the wafer. This allows for precise irradiation control to ensure uniform results regardless of substrate shape or size. The coating-equipment feeds and dispenses photoresist solvent into a coating-box. Here, it can be mixed and thoroughly applied to the wafer. Lastly, a radiation-system applies precisely calibrated, pulsed ultraviolet radiation to the coating unit to generate the desired photochemical reaction. MITOMO SEMICON ENGINEERING MP-1408JSE accommodates substrates of up to 300mm in size and is able to process up to eight substrates simultaneously. Its unique radiation-unit combines the effects of both monochromatic and polychromatic ultraviolet light to allow for fine control of the photochemical reaction. Its integrated cooling unit ensures proper thermal stability and ensures consistency of results from one pattern to the next. Moreover, MP-1408JSE offers a streamlined workflow and user-friendly controls which allow for contextualized monitoring of the irradiation process. It provides feedback on exposure status, photoresist consistency, substrate performance, and other vital metrics. The machine also includes a comprehensive suite of advanced visualization tools and reporting features, allowing users to analyze and improve their processes. Overall, MITOMO SEMICON ENGINEERING MP-1408JSE provides an efficient and cost-effective solution for patterning substrates using photoresist. Its easy-to-use interface and powerful features make it an ideal choice for those who are looking for a reliable and effective photoresist tool.