Used MITOMO SEMICON ENGINEERING MP-1408SE #9280828 for sale

MITOMO SEMICON ENGINEERING MP-1408SE is a photoresist equipment, used for exposing substrates for lithography or printed circuit boards. MP-1408SE consists of a vacuum ultraviolet (VUV) lamp source to provide UV illumination, a mask stage to hold a metal or chromium mask, an optical path between the lamp and mask, and a substrate stage to securely hold and move the substrates. The lamp source produces a VUV beam that is line-focused. Multiple focusing lenses are used in the system to direct the beam through a highly tuned optical path. This allows the beam to be focused down to a small point, thereby providing a high-resolution image on the substrate. The unit also includes a diffusive collimator to ensure uniformity across the substrate and a shield to protect against stray emissions. The mask stage is a high-precision, ultra-stable machine that holds the metal or chrome mask over the substrate. The stage consists of a roller tool to align and stable the mask for exposure. It also contains two precision-grade linear stages, one for horizontal and one for vertical, to allow for precision focusing of the mask on the substrate. The substrate stage is designed to hold a substrate of any size or shape, up to 25mm in length. It has a seven-position chuck to firmly hold the substrate in place during the exposure process. The chuck is mounted on a rotary actuator to give precise and repeatable positioning of the substrate. A UV filter is also mounted on the stage to protect the substrate from the lamp radiation. MITOMO SEMICON ENGINEERING MP-1408SE is a highly reliable and versatile photoresist asset. It provides a quick and accurate exposure, while allowing for precise and repeatable positioning of the substrate. Its high-precision optical components and rugged stages ensure superior image quality and uniformity. It is able to expose a variety of substrate materials including polyimide, silica, and glass. Additionally, its adjustable-power lamp control allows for fine-tuning of the brightness of the beam for optimum resolution and exposure times.