Used MITOMO SEMICON ENGINEERING MP-1408T LN #9243731 for sale

MITOMO SEMICON ENGINEERING MP-1408T LN is a next-generation photoresist equipment designed to bring high precision and high quality to semiconductor device production. This system rapidly and accurately creates thin film layers used as the photoresist mask for the production of high-density devices. MP-1408T LN is designed to be an economical solution for photoresist exposure equipment and can be used to produce a variety of device structures, such as high speed DRAMs, Flash memories and 3D stacked chips. The machine utilizes a specialized optical unit that performs aberration correction, and its image resolution accuracy is 0.25μm with a minimum line width of 0.06μm. MITOMO SEMICON ENGINEERING MP-1408T LN utilizes an ultra-fine pitch aspherical lens as its exposure source, capable of providing a uniform irradiance over a wide range of wavelengths for both visible and ultraviolet light. It is capable of scanning max 13,000mm/min, allowing for high-speed single-beam production. In addition, this photoresist machine features a wide exposure range of 0.25 to 450 μm and a wide range of resolution from 1μm/p to 0.25μm in order to meet the variety of needs for semiconductor device production. MP-1408T LN uses an automated focusing tool for high precision, along with an integrated monitor asset that closely tracks the entire operation process. Its advanced stage model is capable of segmented air bearing table movement and head positioning, allowing for fine tuning and speed adjustment without sacrificing resolution. With the use of the included on-board pre-processing software, process optimization can be readily achieved. In addition, MITOMO SEMICON ENGINEERING MP-1408T LN equipment features superior cleanliness when compared to other photoresist systems, as all of its components are designed and constructed to the highest quality standards. This ensures that semiconductor production can be done with minimal debris, reducing the chance of device contamination and possible production delays. Overall, MP-1408T LN is a highly advanced photoresist system designed to provide high accuracy and precision to semiconductor device production. It features an optical unit that can perform aberration correction and a wide exposure range, with an automated focusing machine and pre-processing software for optimized processes. The machine is also designed for superior cleanliness, ensuring that production can be done with minimal debris.