Used MTI CORPORATION MSK-AFA-I #9283974 for sale

MTI CORPORATION MSK-AFA-I Photoresist Equipment is an advanced and efficient system designed to enlarge the area of exposure in photoresist processes in the semiconductor industry. The unit combines a single photo mask and photoresist chamber with advanced components that provide a combination of agility, exposure area, and quick turnaround time. The machine utilizes an integrated, fully automated stage and a single photomask to expose the photoresist, resulting in a large exposure area in comparison to a standard photoresist tool. The automated asset includes a high-speed driving model, a linear motion stage, a patented LSS eXP stage, an integrated optical equipment, and an advanced plasma-enhanced chemical vapor deposition (PECVD) unit. This system enables a larger exposure area than conventional systems and allows for higher throughput. The MSK's linear motion stage is designed to be highly versatile, incorporating elements such as variable speed drive ramps and a rapid speed monitoring unit. This makes it possible to more tightly control the acceleration of the photomask as it moves during the exposure process and provides precise control over the exposure area in order to achieve higher accuracy when creating complex photoresist patterns. The machine also utilizes Smart EXposure™ with multi-task targets able to achieve new levels of agility and speed, while increasing the efficiency of the process. The tool can also reduce the length of the exposure process by reducing the amount of photomask used, and the integrated optical asset can transfer more than 25% of light into a continuous wave. MSK-AFA-I model also features up to four-stage heating capabilities, allowing for precise control over the photoresist's properties during the exposure process. The equipment also offers a high-yield rate due to a patented magnesium fluoride (MgF2) CVD deposition process which significantly increases the sensitivity of the photoresist to ultraviolet (UV) light. This system also features the patented SPClean100™ unit, a patented cleaning machine that combines a vacuum cleaner with a wet-etch cleaning tool to exhaust and remove all residues from the photomask, providing a clean and reliable photomask for each exposure. Finally, MTI CORPORATION MSK-AFA-I asset is equipped with a proprietary software package, allowing for simple modification of settings, programming of parameters, and automated operation. The graphical user interface (GUI) of the model also gives operators a more intuitive understanding of the exposure processes and allows for efficient control of the photomask in order to achieve a high-quality result for each exposure. MSK-AFA-I Photoresist Equipment is an advanced and highly efficient tool for photoresist processes in the semiconductor industry. It utilizes integrated automated components and software to increase the exposure area along with flexibility and improved accuracy and consistency. The system also offers robust cleaning capabilities as well as a high-yield speed, making it the ideal solution for any photoresist production applications.