Used MTI FLEXIFAB #16662 for sale

MTI FLEXIFAB is a photoresist equipment developed by Molecular Track Imaging (MTI) for directional energy applications. FLEXIFAB utilizes a polymer-based lithography technique, which involves a specific patterned photoresist layer wherein the photoresist materials respond differently to the exposure of UV light along various predetermined pathways. By controlling the image-to-substrate ratio (I/S ratio) and other parameters, desired patterns can be achieved across complex substrates. MTI FLEXIFAB is a function-enabled system with unparalleled lithography versatility. It is capable of producing resolutions comparable to that of the latest Deep UV (DUV) systems, but without the need for expensive DUV hardware. The unit is highly programmable with integrated computer hardware, custom software, wafer recognition and calibration features, and intuitive operation. FLEXIFAB machine is designed specifically for high-speed operation, allowing for quick-turnaround of microelectronic devices. It provides optimum results for photoresist applications such as soft direct write (SDW) and direct imaging (DI). MTI FLEXIFAB has successfully been utilized in the production of dynamic random access memories (DRAMs) and application-specific integrated circuits (ASICs). FLEXIFAB offers great precision in the lithography scope. The tool can produce extremely fine images with great clarity and uniformity. The automatic calibration and wafer recognition feature combined with the use of multiple photomasks and substrates allows for flexibility and precision in terms of perfect alignment of structures. The photoresists used in this asset have extremely high resolution, allowing for optical magnifications of up to 10,000X. The model is especially suited to mass production of microelectronic devices. It allows for refining of existing technologies while also providing cost-effective ways of designing new technologies. In addition, the equipment is compatible with multiple substrates and photomasks. This allows manufacturers the ability to quickly produce large volumes of product with high repeatability and accuracy. In conclusion, MTI FLEXIFAB system is a highly efficient and technically advanced photoresist unit evident by its advanced features, programmability and speeds. It allows for extremely fine images and is compatible with multiple substrates and photomasks. The integrated features, wafer recognition, and repeatability make it ideal for mass production of microelectronic devices in a cost-effective manner.