Used MTI FLEXIFAB #83580 for sale

MTI FLEXIFAB
Manufacturer
MTI
Model
FLEXIFAB
ID: 83580
Coater system, configuration: Send-Rec/ Coat/ Bake/ Bake 275C stepper driven hot plate Tritec resist pump Side dispense for HMDS Additional dispense such as backside EBR, backside wash, top side EBR or bowl wash are available As-is condition.
MTI FLEXIFAB is a photoresist equipment that helps simplify the preparation and processing of wafers for semiconductor manufacturing. It is designed to accelerate the photolithography and via wall etch processes of advanced 3D architectures and heterogeneous integration. The system can be integrated into any standard fabrication facility, allowing for versatility and scalability. FLEXIFAB features a patented technology, referred to as "Smart Flex", that automates the resolution of line stitching, overlay and registration problems. The unit's scalability allows for up to 8-inch substrates and also features 25mm side wall options with fine feature resolution of up to 0.2µm. The Smart Flex feature ensures integrated process control for proper film formation to achieve desired film thicknesses of 1µm to greater than 20µm and is capable of performing register-less wafer registration. The photoresist machine offers high volume throughput by integrating the various steps of photoresist patterning and etchback into one piece of equipment. This streamlines the process, thereby reducing the cost of manufacture. The tool is easy to use, requires minimal operator intervention, and offers improved uniformity and yield performance. The real-time process monitoring and control of the asset allow for effective process management and thereby increased throughput and improved yields. MTI FLEXIFAB supports a number of materials, ranging from silicon to GaAs, and various processes such as etching, wet and dry cleaning, stripping, and nanostructure formation. It is equipped with an advanced optical inspection model that provides powerful process generation and review, maximizing yields and reducing valuable labor hours. The equipment processes photoresists on the chip, layer by layer, and virtually eliminates manual Litho-etch patterning for electronic device fabrication. It is designed for rapid prototyping of electronics, allowing for shorter development cycles, better cost control, and improved product performance. This photoresist system helps increase yield and reduce production cycle time, further improving cost effectiveness.
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