Used MTI FLEXIFAB #9094989 for sale

MTI FLEXIFAB is a photoresist system based on a chemically amplified chemistry. It is composed of an acid generator, a silane- terminated monomer, a photoinitiator, and a developer. It is designed to provide high-resolution, large-area imaging and etching results in the production of flexible electronic circuits and systems. The acid generator contained in FLEXIFAB is a photopolymerized aliphatic polyimide and it produces acid upon exposure of UV radiation. This acid provides the foundation for the photoresist's contrast control. The silane-terminated monomer is added to the acid generator to enhance and stabilize the structure and properties of the photoresist. It also adds etch resistance and is able to survive high- temperature and corrosive process environments. The photoinitiator is then added to the formulation in order to provide the photoresistor's photoactivity. The photoinitiator reacts to light and creates reactive species which initiate the photopolymerization process. These reactive species sulfonate the aliphatic protons on the matrix and cause the cross-linking of the formulation generating the resist structure on the substrate. The developer used in MTI FLEXIFAB is a solvent based alkaline composition. Dark field or bright field imaging techniques can be used to set pattern joints in the photoresist once it has been exposed to the UV source. During the development process, this alkaline is applied to alleviate the exposed and insoluble resist material and "develop" the desired pattern. The combination of the acid generator and the silane-terminated monomer is designed to increase the performance of the etching of the flexible electronics. The resin is designed to be capable of etching a wide range of flexible substrates like ITO, stainless steel, polyimide, polyester, and polypropylene. FLEXIFAB provides good resolution in terms of line width, thickness and edge definition performance when used with these substrates. Overall, MTI FLEXIFAB provides a unique solution of materials for the image and etching of flexible electronics. It is a reliable photoresist system that provides high-resolution imaging, excellent etching performance, and excellent line width, thickness and edge definition. Its ability to withstand harsh environments and its wide range of substrate compatibility make it a very attractive choice for flexible circuit production.