Used MTS 1913-E01 #9046517 for sale

MTS 1913-E01 is a photoresist equipment designed for use in microelectronic fabrication processes. It is a spin-on type photoresist system designed to be used in thespin coating process, which is the most common process used in substrate preparation for semiconductor manufacturing. 1913-E01 photoresist unit consists of two components: the sensitized resist, which is the photoresist applied to the substrate, and the developer, which is used to remove the non-active and exposed portions of the resist. The sensor resist is a water-soluble liquid-formulated product containing components that provides a film build-up on the substrate when applied. It chemically reacts to UV light of a specific wavelength. Following the exposure to UV light, the substrate is then developed using the developer solution. The developer solution contains reactive compounds that when activated, will etch away only the exposed photoresist material, resulting in an etched pattern on the substrate. MTS 1913-E01 photoresist machine has been heavily tested and used in a wide variety of microelectronic processes. It is a high-performance tool with superb resolution and excellent edge definition. It also provides exceptional uniformity of the resist remaining, and can be precisely controlled to achieve accurate layer and feature dimensions. The process results in a highly reliable and cost-effective photoresist asset for microelectronic fabrication. The model is easy to use, requires minimal operator training and eliminates the need for manual pre-treatments. It also has excellent shelf-life stability when stored in a clean and cool environment. In addition, its high-solvent resistance allows it to resist aggressive organic solvents, acids and bases. In conclusion, 1913-E01 photoresist equipment is an ideal choice for the fabrication of semiconductor and microelectronic devices, providing excellent results in terms of resolution, edge definition, layer uniformity, cost effectiveness and compatibility with aggressive solvents.