Used MUSCAT SPL-455 #9198107 for sale

Manufacturer
MUSCAT
Model
SPL-455
ID: 9198107
Wafer developer.
MUSCAT SPL-455 is a photoresist equipment designed for use in semiconductor fabrication processes. It is developed by Mitsubishi Chemicals and is designed to provide high purity, uniformity, and reliability in a wide range of photolithography applications. Unlike conventional photoresist systems, SPL-455 is designed to withstand high temperatures, making it ideal for pellicle processing and other wafer-level processes that require high temperature stability. The system consists of an electrochemical etch bath and a high purity photo-active agent which, when exposed to ultraviolet light, creates an electrochemical reaction on the substrate that results in etching of the photoresist layer. The photo-active agent in MUSCAT SPL-455 is comprised of a blend of several high purity compounds, including a stabilizing agent such as a salt, an acid, an oxidizing agent, and a photoresist solvent. When the etching bath is exposed to the UV light, the compounds in the photo-active agent become charged, triggering the electrochemical reaction. This results in the etching of the photoresist layer, allowing for a much higher degree of resolution and repeatability than with conventional photoresist systems. The electrochemical etch bath itself is designed to maintain temperature and chemical levels consistently and precisely, allowing for reproducibility and quality without requiring frequent maintenance or calibration. The unit also offers a wide variety of process control mechanisms, including multiple customizable parameters, such as the etch speed and the etch rate, as well as advanced tooling and software designed to improve automation. SPL-455 is a reliable, high-quality photoresist machine that offers a wide range of features and is highly versatile, making it ideal for semiconductor fabrication processes. With its advanced materials, technology, and processes, the tool provides users with unmatched reliability and performance.
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