Used NANO OPTICS HAZE 2 #293589807 for sale

Manufacturer
NANO OPTICS
Model
HAZE 2
ID: 293589807
Wafer Size: 12"
Lithography system, 12".
NANO OPTICS HAZE 2 is a photoresist equipment developed by industrial materials giant Honeywell. This system is designed to be an easy-to-use photomasking process for thin-film deposition, photolithography and other related applications. The unit utilizes a unique wavelength-dependent polyurethane haze filter which provides a consistent light level across a wide range of wavelengths and intensity. HAZE 2 machine is composed of three components: the polyurethane haze filter, the power supply and the exposure control unit. The haze filter is what absorbs the ultraviolet radiation emitted by the light source and reduces the intensity of the exposure. This filter tends to maintain a uniform intensity across a broad range of UV wavelengths, which is essential for consistent thin-film deposition. The power supply provides the required power for the exposure control unit and the haze filter. Finally, the exposure control unit consists of a microprocessor with a graphical user interface that allows the user to adjust the exposure settings on the fly. Another key feature of NANO OPTICS HAZE 2 tool is its anti-contamination design. The asset is constructed with a base, platform and modular hood, which together contain all of the model components in a sealed environment. This anti-contamination design helps to ensure that no dirt, dust or other contaminants will be trapped by the haze filter and make their way onto the substrate being processed. The entire equipment is designed to make the photomasking process easier and quicker so that thin-film deposition can be done in a fraction of the time it takes with more traditional photomasking processes. Additionally, the consistent exposure provided by HAZE 2 system ensures consistent thin-film deposition thicknesses as well as improved yields and throughput. In conclusion, NANO OPTICS HAZE 2 photoresist unit is a powerful and effective tool for quickly and accurately performing a wide range of photolithography and thin-film deposition processes. The machine's compact design and anti-contamination features make it an ideal choice for those looking for a reliable, efficient and cost-effective way to perform these processes with consistent results.
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