Used NEXX SYSTEMS Stratus 300 #9289374 for sale

NEXX SYSTEMS Stratus 300 is a photoresist equipment used in semiconductor fabrication processes. It is specifically designed to etch high quality patterns onto wafers with a high resolution patterning capability down to 1µm/line widths. Stratus 300 offers state-of-the-art photoresist technology with an advanced multi-beam UV source capable of producing up to 3J/cm2 of exposure energy with a wavelength of 365nm. It also includes an optimized wavelength optimization system with a high contrast ratio and low reflection for improved etching accuracy. NEXX SYSTEMS Stratus 300 features a fully automated alignment unit with an integrated metrology machine for measuring critical features and can handle wafers up to 8-inch diameter. The tool utilizes a dynamic exchange mechanism for wafer exchanges and quick loading and unloading. In addition to its high resolution etching capabilities, Stratus 300 offers data handling and control systems using advanced computer software for tracking, control and reporting of all pertinent photoresist etch recipes. This allows for faster, more accurate etching operations with the ability to monitor and record results for quality control and detailed error tracking. NEXX SYSTEMS Stratus 300 also includes a unique auto-focus feature with a maximum reticle size of 75mm that enables it to etch with high accuracy down to the nanometer level. Additionally, an auto-leveling asset ensures that the etch is uniform throughout the wafer by controlling process parameters such as mask tilt, focus, resist thickness and exposure. Overall, Stratus 300 is an advanced and reliable photoresist model with a wealth of features and capabilities. With its high resolution etching accuracy and ability to precisely control the etching process, NEXX SYSTEMS Stratus 300 is an ideal solution for semiconductor fabrication.