Used NTACT nRad 2 #293736651 for sale
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ID: 293736651
Die coater, 12"
Uniformity: ±3%
Maximum coating speed: 100 mm/s
Coating thickness: 20nm - 100µm (dry)
Fluid viscosity: 1cps - 60cps
Manual substrate handling
UL and CE Compliant
Compressed gas supply: 100psi
Vacuum: 25 in HG
Power supply: 15 A, 120 VAC, 50-60 Hz, 1 Phase, 3 wire.
NTACT nRad 2 is an advanced photoresist equipment that has been specifically designed for high-resolution patterning and imaging applications in semiconductor manufacturing, flat panel display production, and other microelectronics industries. This system offers a wide range of features and capabilities that make it ideal for use in the production of complex integrated circuits, sensors, and microelectromechanical systems (MEMS). One of the key features of NTACT NRAD2 photoresist unit is its high precision and repeatability, which is essential for achieving the desired pattern fidelity and resolution in semiconductor lithography. The machine is equipped with advanced optical alignment and focusing capabilities, allowing for precise alignment of the photoresist layer with the underlying substrate. This ensures that the patterns created by the tool are accurately transferred onto the substrate with high resolution and fidelity. NRad 2 asset also offers a wide range of exposure options, including UV, deep UV, and electron beam lithography, allowing users to choose the most suitable exposure method for their specific application requirements. The model is capable of handling a variety of photoresist materials, including positive and negative tone resists, as well as chemically amplified resists, providing users with flexibility in selecting the most appropriate resist for their process needs. In addition to its high precision and flexibility, NRAD2 photoresist equipment also offers high throughput capabilities, allowing for rapid patterning and imaging of large-area substrates. The system is equipped with a high-speed stage and robotic handling capabilities, enabling efficient processing of multiple wafers in a single run. This high throughput capability is essential for meeting the production demands of high-volume semiconductor manufacturing and other microelectronics applications. Another key advantage of NTACT nRad 2 unit is its advanced process control and monitoring features, which enable users to optimize and fine-tune their lithography processes for the best possible results. The machine is equipped with real-time monitoring tools that allow users to track key process parameters such as exposure dose, focus, and alignment accuracy, enabling them to make rapid adjustments to optimize their lithography process and ensure consistent patterning results. Overall, NTACT NRAD2 photoresist tool is a powerful and versatile tool for high-resolution patterning and imaging in semiconductor manufacturing and other microelectronics applications. With its advanced precision, flexibility, high throughput capabilities, and advanced process control features, this asset is an ideal choice for researchers and manufacturers looking to achieve high-quality patterning results in their advanced microelectronics devices.
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