Used NTACT nRad #9410379 for sale

NTACT nRad is a photoresist equipment developed by NTACT Corporation. This advanced photoresist system offers superior features regarding performance, uniformity, and compatibility. It is ideal for fabrication of advanced semiconductor components, biomedical products, and MEMS (Micro-Electro-Mechanical Systems). In simple terms, nRad photoresist unit uses a photosensitive liquid layer to create a patterned surface. After the liquid layer is exposed to a specific wavelength of light, the exposed layer can be developed and act as an insulating layer for the metallic layer. The exposed layer reveals the patterned layer on the top. NTACT nRad machine uses a unique suspension design with advanced mixing capabilities, which makes it highly suitable for large scale production processes. The suspension can also be very fine tuned to meet customer needs as per specific application requirements. The tool also offers fine control of nanometer-scale feature sizes. The advanced mixing capabilities and intricate structure can be highly scaled along with the desired feature size. This allows for precise feature size adjustment. Apart from standard photoresists, the asset is also capable of working with advanced resist chemistries such as SU8 and ECP (electrochemically polymerize). It also offers excellent compatibility with advanced technologies such as ion beam etching and laser processing. The model also offers excellent performance in terms of uniformity and resolution. NRad equipment has a minimum feature size of 0.6 microns, a line width adjustability of 0.1 microns, and a uniformity of +/- 0.005 microns. NTACT nRad photoresist system is highly efficient and offers excellent performance at a reasonable cost. This advanced photoresist unit can be used to fabricate semiconductor substrates, biomedical products, and MEMS components with excellent precision and efficiency.