Used NTACT nSpire #9238175 for sale

NTACT nSpire is a photoresist equipment designed to enable photolithography solutions for nano device manufacturing. It is a nanoscale fabrication method that uses light to create patterns on a substrate. NSpire system is comprised of three main components that work together to enable the photolithographic process. First, the unit includes a photoresist processor which supplies the substrate with the material needed for the photolithographic process. The processor is capable of delivering the photoresist material with a consistent and uniform coating thickness for precise patterning. Second, the machine consists of an optical imaging tool that provides illumination and specialized optics to direct the light to the substrate. The optics are designed to provide a highly focused beam of light of a wavelength that is absorptive to the photoresist material. This enables the beam to create a precise and repeatable pattern on the substrate. Third, the asset includes a Z-stage platform which is responsible for positioning the lens and substrate relative to each other to ensure the best possible imaging quality. Additionally, it ensures that the substrate still has the desired orientation and movement range during the exposure process. Finally, the model is run by an operating software which manages all aspects of the photolithography process. This includes controlling all of the components and sub-systems, adjusting settings, selecting and loading recipes, and monitoring the process. The software also allows for data logging and record keeping for post-processing review and analysis. Overall, NTACT nSpire is a onestop company for high-precision photolithography solutions. It offers precise on substrate image formation, accurate patterning capabilities, higher throughputs, and a wide range of process options for a wide variety of applications. NSpire equipment provides a reliable and cost-effective solution to manufacturers looking to produce nano-scale devices.