Used OHMIYA CORPORATIONOKH 640SAF #9203891 for sale

OHMIYA CORPORATIONOKH 640SAF is a high performance photoresist equipment designed to provide superior productivity, accuracy, and repeatability for microelectronic and semiconductor device fabrication. The system incorporates advanced technology to accurately pattern photoresist on substrates such as silicon wafers and other substrates used in device fabrication. The unit consists of a scanner stage which positions and orients the substrates for optimal patterning. It is equipped with an ultrahigh resolution, digital imaging machine, a precise laser-based selective exposure tool, and a high-precision, low-speed optical asset for consistent and accurate photographic exposures. The model also incorporates a multi-zone metrology equipment for automatic sample profiling. The system utilizes a high-resolution transparent pellicle that is exposed to an ultraviolet (UV) laser beam. The transparent pellicle is then moved over the sample and exposed to additional laser energy. The combination of the transparent pellicle and the UV laser beam enables accurate definition of fine-grained features, even at high lithography resolution (450nm). 640SAF also incorporates sophisticated image-processing algorithms for accurate mask-alignment of the patterned device to the substrate. Furthermore, it is capable of providing accurate feedback to the user on the uniformity and repeatability of the imaging process, thus helping to ensure consistent, high-quality results. In addition, OHMIYA CORPORATIONOKH 640SAF provides the flexibility of multiple substrate size accommodating for various types of semiconductor devices. Furthermore, its adjustable mask opening technique enables users to easily switch from a single exposure to multiple exposure modes. In this way, users can quickly adjust the unit to suit varying product requirements. Overall, 640SAF is a reliable and versatile photoresist machine that provides optimal productivity, accuracy, and repeatability for various microelectronic and semiconductor device fabrication processes. Its multiple operating modes enable users to quickly switch between different production techniques, allowing for a wide range of device design complexity levels. Furthermore, the tool's sophisticated algorithms enable quick and accurate alignment of the device design to the substrate, thus providing high-quality microelectronic products.