Used OKK OKK-500M #9153451 for sale

OKK OKK-500M is a high-precision photoresist equipment and a major step forward in the evolution of modern lithographic techniques. By combining advanced optical technology, nano-positioning precision and automation, this system provides superior image resolution and process stability in a versatile, easy to use design. It is suitable for a wide variety of applications in areas such as MEMS, compound semiconductors, and flex printed circuit boards, as well as traditional device fabrication. OKK-500M is a turnkey automation unit with a 12-channel multilayer tray stacker, enabling multi-layer processing for high capacity production. It is designed for uniform and precise film thickness control in real time, giving excellent results even for small feature sizes and widths down to 50nm. Its advanced laser beam scanning technology delivers flip-chip resolution of up to 4um, with high repeatability and accuracy without drift. OKK OKK-500M achieves this through its field-variable optical interferometer (FOI) that controls the amount of light applied to the photoresist through advanced adaptive optics. In addition, an ion beam deposition machine is available to maximize film uniformity. For easy operation, the tool comes with a large touch screen interface and incorporates a powerful 30 KH processor. PID temperature control eliminates temperature gradient issues and its highly efficient deposition tools reduce particle contamination. The asset also supports non-contact metrology systems for faster process start-up and monitoring alike. Finally, OKK-500M's multi-target high-throughput scanning model allows a variety of photomask formats, with focus control stepper resolution below 30nm. This makes it ideal for positioning photomask features, and ensures perfect repeatability when sequential prints are required. All these features and more make OKK OKK-500M an extremely powerful photoresist equipment. Its versatility, reliability and cost-effectiveness combined with its high-level of precision make it ideal for any environment with complex process requirements. It is the perfect choice for any advanced lithographic technology used in today's modern nano-fabrication.