Used OKK OKK-604M #9097634 for sale

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OKK OKK-604M
Sold
Manufacturer
OKK
Model
OKK-604M
ID: 9097634
Vintage: 2006
Spin rinse dryer (SRD) 2006 vintage.
OKK OKK-604M is a photoresist equipment designed for a wide range of applications. The system features a combination of high resolution, high throughput, and pinpoint accuracy. It is, in fact, a highly automated exposure device that uses both visible and near-infrared laser sources for fast, precise patterning of photoresist materials. OKK-604M allows for a variety of exposure patterns and intensities throughout the process. Its robust beam delivery unit consists of segmented microscope objectives and adjustable shutters that allow for highly precise control of exposure over various levels. The machine also enables quick and easy switching of laser parameters such as wavelength, spot size, and pulse duration to fit the particular application. Additionally, the tool is safeguarded against overheating due to its advanced temperature control mechanisms. OKK OKK-604M also features a built-in wafer turner, allowing users to expand its capability to process not only flat patterns, but also relief patterns, curved patterns, and stepped patterns. This is made possible through the asset's large mechanical design and rigid construction enabling stable imaging. Its unique software application also enables multilevel exposure, from contact size to larger projections as well as low duty cycle pulse shaping capabilities. OKK-604M offers superior speed and accuracy with its advanced imaging capabilities, high throughput, and low aperture losses. The model also provides excellent flexibility and repeatability with its wide variety of patterning techniques from flat to relief patterns. In short, OKK OKK-604M is an efficient and reliable photoresist equipment that offers a combination of high resolution patterning, fast throughput, and pinpoint accuracy. Its robust beam delivery system, temperature control unit, and automated wafer turner make it the perfect choice for a wide range of photoresist applications.
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