Used OKK SRD #9135547 for sale

OKK SRD is a high-performance photoresist equipment designed for semiconductor fabrication. It is the optimal solution for producing high resolution substrates. Photoresists are light-sensitive chemical compounds, often used in semiconductor device fabrication process. This application requires the development of high performance and reliable photoresist systems. SRD provides a complete line of reliable, robust and reliable photomask systems to meet a wide range of demanding requirements. It offers a sophisticated production process with a high degree of accuracy, quality and reproducibility. This system is based on a single component compound of polyvinylphenol, which is used to formulate the photoresist. Photosensitive compounds are synthesized with both positive and negative photoresist layers. This photoresist layer is applied to the substrate and is then exposed to light in patterned form. The positive photoresist is used to create positive patterns, while the negative photoresist creates negative patterns. After exposure, the photoresist is developed to reveal the patterns on the substrate. OKK SRD provides a wide range of performance advantages that include high resolution, superior sensitivity and excellent adhesion. It also provides protection of the photoresist against abrasion and physical damage. It also offers enhanced reproducibility, uniformetching, deep etching, and low residual photoresist. This unit is extremely reliable and highly safe for use in the semiconductor industry. The machine is also designed to reduce setup time and improve the photolithography workflow. With the help of automatic exposure control, the tool helps to improve the repeatability of the photoresist process. This asset also includes a fast curing process that reduces step times and improves the yields. SRD is the optimal choice for producing extremely high accuracy and extremely fine resolution photomasks. It also provides a competitive economic advantage by using a simple and cost-efficient one-component photoresist formulation. This reliable photoresist model is an ideal choice for advanced semiconductor device fabrication and is becoming increasingly popular as the production of ever more complex substrates is required.