Used OPTORUN Gener-2500 #293609912 for sale

The OPTO RUN OPTORUN Gener-2500 is a state-of-the-art photoresist equipment designed to provide advanced photolithographic processing and advanced photoresist services in the production of microelectronic devices. The system utilizes a precision light diffusion unit in conjunction with advanced photoresists to enable precise, efficient and cost-effective production of microelectronic devices. The machine is designed with advanced temperature, humidity and pressure control systems, ensuring accurate processing conditions and consistent photoresist performance. The tool utilizes a range of photoresists, including negative photoresists, to enable a wide range of device production options. The negative photoresist allows for the creation of complex devices with fine resolution, high precision and excellent mechanical properties, while maintaining a low overall cost of production. The use of more advanced photoresists allows for higher resolution and improved link size, allowing for more complex devices and more efficient use of photoresists. The asset uses a variety of advanced process parameters to ensure accurate and efficient photolithographic processing. It includes a patented light diffusion model that minimizes distortion while increasing resolution through advanced optical coatings.The equipment also features a high-performance heater and cooling systems, enabling precise temperature and humidity control, which are key components in achieving consistent results. It also features a high-efficiency gas scrubber to reduce particulate matter in the processing environment. The system also implements advanced safety features, such as a safety interlock unit, designed to protect personnel and equipment from unnecessary damage. In addition, the machine utilizes a comprehensive alarm tool, which alerts operators of unsafe conditions and potential process issues. In short, the OPTO RUN Gener-2500 provides advanced photoresist services in the production of microelectronic devices. It utilizes a wide range of photoresists, advanced process parameters and advanced safety features, allowing for improved device production outcomes and consistent production results.