Used OPTORUN OTFC-1300 #9190582 for sale

OPTORUN OTFC-1300 photoresist equipment offers users a reliable and efficient means of processing film and wafers. Using this photoresist system, the substrate material can be exposed to a specific pattern determined by a computer-aided design (CAD) unit. This machine promises to be an ideal tool for precision and accuracy in microelectronic lithography. OPTORUN 1300 specifically utilizes photolithography in order to create a desired pattern on the substrate material. Photolithography involves a material being exposed to light which alters the material properties in some manner. OTFC 1300 photoresist projection tool optimizes this process by using a vacuum chamber with a mask stage and an illumination asset. The mask stage is where the CAD-designed photomask is placed, and the illumination model consists of a light source with an output lens equipment. The light output lens system alters the beam of light coming from the light source, and the pattern of the photomask influences how the light impacts the substrate material. OPTORUN OTFC 1300 has several advanced features. It is equipped with a vacuum unit that can rapidly adjust for changes in the environment, protecting against any potential damaging effects from the rapid changes in pressure. The machine also employs a cooling tool to prevent overheating from the light source and to ensure consistent and precise performance. 1300 boasts a high-concentration gain feature, allowing for increased optical beam densities with minimal loss. Finally, this photoresist asset offers auto-alignment technology, ensuring that each layer is always properly aligned. Overall, OTFC-1300 photoresist model is a powerful tool for creating intricate and precise patterns on substrate materials. It is optimized for accuracy, efficiency, and reliability, and it is well-suited for those looking to accomplish a variety of tasks in the microelectronic lithography industry.